Laser Wafer Coring Services
Cold, Clean, Precise — Zero Thermal Damage with Synova Laser MicroJet Technology
Dynamic Process Group provides laser wafer coring services using the Synova Laser MicroJet (LMJ) platform. Laser coring is the preferred method for device wafers, SOI substrates, Si-Photonics wafers, and any application where thermal damage, micro-cracks, or surface contamination from mechanical saws would be unacceptable.
How It Works
The Synova LMJ confines a pulsed laser beam inside a thin, laminar water jet using total internal reflection. The water jet simultaneously removes debris and cools the cutting zone, preventing heat from diffusing into surrounding material. Heat-affected zone: effectively zero. Surface roughness: single-digit microns. Kerf width: under 100 microns. No measurable subsurface damage.
Materials We Core
Silicon (Si), Silicon-on-Insulator (SOI), CMOS device wafers, Si-Photonics substrates, Germanium (Ge), Gallium Arsenide (GaAs), Indium Phosphide (InP), Silicon Carbide (SiC), Bonded wafer stacks.
Contact us for a quote: info at waferfab.net